| TNE081 | Semiconductor Technology, 10,5 ECTS credits. /Halvledarteknik och tillverkning/ |
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Prel. scheduled
hours: 84 |
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Area of Education: Science Subject area: Physics |
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| Advancement level
(A-D): D
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| Aim: The aim of the course is to present the fundamental principle of semiconductor devices and how models of devices can be created from this understanding. How the semiconductor devices are fabricated? Basic unit processes will be presented. The students get the basic knowledge that is necessary to understand, work and produce integrated circuits and optoelectronics. |
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| Prerequisites: (valid for students admitted to programmes within which the course is offered) TNG001 Calculus, TNG002 Linear algebra, TNG012 Physical Modelling, TNE041 Modern physics, TNE073 Electromagnetic field theory and Electromagnetism. Note: Admission requirements for non-programme students usually also include admission requirements for the programme and threshhold requirements for progression within the programme, or corresponding. |
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| Supplementary courses: TNE078 Charge Transport in Organic and Inorganic Materials, TNE067 System Design. |
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| Organisation: 31x 2h Lectures and tutorial. 3x 4 hours laboratory work. Weekly Home assignment |
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| Course contents: Basic semiconductor physics, concept and mechanisms such as band diagram, valence- and conduction band, Fermi level, Fermi-Dirac statistics, band gap, effective mass, drift, diffusion, doping, intrinsic, extrinsic, electron-hole pair, charge generation and recombination, minority carriers, majority carriers etc. will be discussed thoroughly. Function and modelling of pn-junctions, contact potential, depletion region, and different break down mechanisms for pn-junctions will be explained. Functions and I-V characteristics of some other devices such as MOSFET and bipolar transistors will also be discussed. Basic unit processes such as ion implantation, diffusion, thermal oxidation, anealing, deposition processes such as evaporation, sputtering, CVD, epitaxial growth, fabrication processes such as optical and non-optical lithography, photoresist and etching will be introduced. The students should enter deeply into one of the subjects below and present their work for the whole class. Device isolation, Contacts and metallization, CMOS technology, GaAs technology, bipolar technology and MEMS. Laboratory assignment includes device simulation in PSPICE and classical labs with diode and transistor measurements. |
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| Course literature: 1-Jasprit Singh, "Semiconductor Devices, basic principles, Wiley & Sons 2002 ISBN 0-471-36245-X. 2-Introduction to Microfabrication;Sami Franssila, Wiley&Sons (2004) ISBN: 0470-85106-6 |
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| Examination: | |||
| Written examination Laboratory work Assignment, written and oral presentation |
5 p 1 p 1 p |
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| Course grade (U,3,4,5) | |||
Course language is English. Department offering the course: ITN. Director of Studies: Amir Baranzahi Examiner: Amir Baranzahi Course Syllabus in Swedish |
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