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Valid for year : 2014
 
TFYA41 Thin Film Physics, 6 ECTS credits.
/Tunnfilmsfysik/

For:   MFYS   MPN   Y  

 

Prel. scheduled hours: 40
Rec. self-study hours: 120

  Area of Education: Science

Main field of studies: Physics, Applied Physics

  Advancement level (G1, G2, A): A

Aim:
The course should give knowledge on mechanisms and processes for synthesis of thin films and coatings and properties thereof. Included is also an overview of industrial applications of thin films and coatings, e.g. for surface protection, optics and microelectronics. After the course the student should:
  • have knowledge on how a vacuum system is designed and be aware of the operation principles of its components
  • know the principle, the advantages and the disadvantages of different thin film deposition methods
  • understand the fundamental atomistic mechanisms that determine the thin film nucleation and growth, as well as the effect of the process conditions on the nucleation and growth.
  • be aware of the physical principle and be able to discuss advantages and disadvantages among different methods used for analysis of thin films as well as thin film growth processes
  • have insights in possibilities and the importance of different thin films and coatings for a variety industrial applications.


Prerequisites: (valid for students admitted to programmes within which the course is offered)
Knowledge of fundamentals of materials science, crystallography, solid state physics and thermodynamics

Note: Admission requirements for non-programme students usually also include admission requirements for the programme and threshhold requirements for progression within the programme, or corresponding.
Organisation:
Teaching will be provided in the form of lectures, laboratory exercises, and visit to industries.
Course contents:
Vacuum technology, thin film formation, epitaxy, thin film deposition technologies and methods, characterization of thin films and thin film synthesis processes, optical and mechanical properties of thin films, computer simulations for thin film growth processes.

Course literature:
T. Michely, J. Krug, â?oIslands, Mounds and Atoms: Patterns and Processes in CrystalGrowth Far from Equilibrium", Springer 2003.
P. M. Martin, â?oHandbook of Deposition Technologies for Films and Coatings", Elsevier 2010.
M. Ohring, â?oMaterials Science of Thin Films", Academic Press 1991.
Additional material (e.g. review articles) available for download (password protected) on the course homepage

Examination:
A written exmination
Laborative exercises
Visit to industry
Student presentations
 4,5 ECTS
0,5 ECTS
0,5 ECTS
0,5 ECTS
 


Course language is English.
Department offering the course: IFM.
Director of Studies: Magnus Johansson
Examiner: Kostas Sarakinos
Link to the course homepage at the department


Course Syllabus in Swedish

Linköping Institute of Technology
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Contact: TFK , val@tfk.liu.se
Last updated: 10/21/2013